Used TEL / TOKYO ELECTRON Indy-I-L #9394512 for sale

TEL / TOKYO ELECTRON Indy-I-L
ID: 9394512
Wafer Size: 12"
Furnace, 12" LT ALD SiN.
TEL / TOKYO ELECTRON Indy-I-L is an etcher / asher designed for semiconductor substrate processing. It offers high performance in etching, deposition, and surface treatments. TEL Indy-I-L is a flexible tool, allowing the user to choose from numerous recipes and production modes to meet their requirements. TOKYO ELECTRON Indy-I-L is equipped with a plasma source with a hi-ratio inductive coupling plasma (ICP) source. This source provide high etching rate and uniformity even with very high aspect ratio structure. The tool also has a dual transducers and Anti Vibration System (AV®) design for superior performance. The chamber is also equipped with an efficient heat exchanger for fast heating and cooling to reduce cycle times. Indy-I-L has an intuitive user-friendly operating panel that makes the unit easy to use. The user can set etch parameters in the software using the password-protected access. This simplifies the process, and provides a secure way to store etch recipes. The software also includes a built-in database and documentation to assist with recipe development. For etching, TEL / TOKYO ELECTRON Indy-I-L supports a wide range of etching chemistries including high density plasma (HDPET), oxygen (O2), sulphur hexafluoride (SF6) and tetrafluoromethane (CF4). The tool also supports a range of reactant gases including nitrogen (N2), hydrogen (H2) and argon (Ar). TEL Indy-I-L also boasts a high uniformity of etching, enabling fine-pitched geometries and critical patterning processes. For deposition, TOKYO ELECTRON Indy-I-L has a direct plating technology (DIP) that enables high-rate, high-uniformity, thin-film deposition. The tool also has the capability to perform ion-assisted deposition (IAD) and low-pressure chemical vapor deposition (LPCVD). Indy-I-L is also equipped with an advanced wafer transfer system (WTS) for safe and fast transfer of wafers. This efficient wafer handling system eliminates possible damages and contamination during transfer. Overall, TEL / TOKYO ELECTRON Indy-I-L offers stability, accuracy and repeatability in semiconductor substrate processing. It is an efficient and reliable tool that supports a wide range of etching and deposition techniques, and wafer handling systems. It is an ideal choice for complex semiconductor substrate processing requirements.
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