Used TEL / TOKYO ELECTRON Indy Plus-A-M #293591864 for sale

ID: 293591864
Wafer Size: 12"
Vintage: 2013
Furnace, 12" Process: Low temperature nitride Does not include Hard Disk Drive (HDD) 2013 vintage.
TEL / TOKYO ELECTRON Indy Plus-A-M is an advanced etcher/asher optimized for semiconductor production. It is able to process various types of substrates, from the thinnest dielectric layers to the thickest metal layers, while maintaining excellent precision with smaller pattern dimensions. The easy-to-use and flexible design of the machine makes it ideal for both advanced process development and high-volume production. One of the most important features of TEL Indy Plus-A-M is its Rapid Process Development (RPD) technology. The equipment is capable of high-speed etched processing times, allowing users to rapidly develop optimized etching processes. The etcher also provides high precision control over etching process parameters, resulting in reproducible repeatable results. It also offers several techniques to optimize film uniformity and reproducibility. TOKYO ELECTRON Indy Plus-A-M also features advanced vacuum technology for vacuum-based etching applications. The system features a high vacuum pressure capability of up to 5x10-2 mbar, allowing etching of even the thinnest layers of materials. In addition, the advanced vacuum technology minimizes gas diffusion and maintains the requisite low etching temperatures, which is important for the successful etching process. In addition to excellent etching results, the unit is also equipped with advanced safety systems, such as the advanced automatic load and unload machine, which ensures safe and efficient handling of substrates. All tool parameters, including temperature and pressure, can be easily monitored and adjusted as needed. This reduces the risk of errors while providing superb etching results. In addition, Indy Plus-A-M is highly reliable and offers performance consistency through long production runs. Overall, TEL / TOKYO ELECTRON Indy Plus-A-M is a reliable and high-precision etcher/asher optimized for semiconductor production. Its robust features promote rapid process development, high precision control, and excellent film uniformity and reproducibility for successful production runs. The advanced safety systems ensure safe handling and the asset's normal performance consistency make it a great choice for the demanding environment of semiconductor production.
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