Used TEL / TOKYO ELECTRON INDY PLUS B M #293637534 for sale
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ID: 293637534
Wafer Size: 12"
Vintage: 2010
Diffusion furnace, 12"
Carrier stage body
Main body
Vacuum box
X-Precursor bubbler box
Option box
Heater
PWR Box:
XP41VP
(2) XP42VP
XS7VP
XP2
XS5
Pump interphone
MM1 INTFC 2XP1
XP56VP
XS73VP
(2) XT902 TMA SAFTY Unit
XS103VP
XP776VP
XT 514-8
XT516
XT739
(2) XT901 TMA SAFTY Unit
Interphone XP92VP
XT530
XP40VP
GRSO PCB CN1
GRSO CN2
(5) XT513
(11) XT514
(5) XT510
XT513-1
XT513-2
XT513-3
XT510-7
(2) XP 1028 EXC
XP 1023 EXC
XP 1024 EXC
XP 1025 EXC
T/C Unit
T/C Cable
T/C Box
Control box top cover
Gas piping duct
RCU Piping box
Piping
Gas detector
Smoke detector
T/C Junction box
G/Box exhaust connection
FNC TOP Exhaust connection
O2 Analyzer
Vacuum box cover-1
Control box fox jig
Cooling water piping
Facility connection cover
Scavenger cover
Heater panel
Vacuum box cover-2
Heater frame support
Option box cover
Shutter corer
Carrier stage TOP Cover front panel
Fixed tripod
Positioning iron piece
Screws
Manifold
Main valve
Vacuum piping P1
Vacuum piping P2
Vacuum piping P3
Vacuum piping P4
Vacuum piping P5 (Bellow)
Inner tube support ring
Pedestal plate
Center ring
Outer tube lock ring
Boat rotate support
Inner tube lock ring
Outer tube seal ring
Manifold heater
Vacuum piping tape heater
Manifold ceiling water piping
Leak check port handle valve
Vacuum piping clamp
Heater insulator
Power box
2010 vintage.
TEL / TOKYO ELECTRON INDY PLUS B M is a powerful etching equipment designed to meet the demanding requirements of today's semiconductor manufacturing processes. This etcher is capable of processing various substrates ranging from silicon to organic materials such as plastics and organic light emitting diodes (OLEDs). The system's advanced etching process, called physical vapor deposition (PVD), allows for precise control of the shape, size, and composition of each layer. It features a highly uniform deposition pattern and a high process yield. The etcher is equipped with a high-performance chemical vapor deposition (CVD) facility for performing rapid and uniform plasma etching of layers. TEL INDY PLUS B-M offers a range of temperature control options to allow for optimal etching conditions. It includes both a hot plate and induction heater, enabling precise temperature control up to 2000°C. An electromagnet in the etch chamber helps maintain uniform deposition across the sample. The unit also includes an innovative automated chamber height control mechanism which ensures level substrate height and uniform plasma dispersion over the substrate. What really sets TOKYO ELECTRON INDY PLUS-B-M apart is its user-friendly, high-precision plasma etching software. The machine features a robust user adjustable power control for controlling etch time, power and duty cycle. Through its powerful automation modes, the etcher enables easy process development and optimization. It also features a 3D graphical display of the etch chamber which enables users to monitor and control the etch process. In addition, TOKYO ELECTRON INDY PLUS B-M features a powerful optical emission spectrometer for precise end point detection. A quartz tube oven is also included for strain free processing of thermally unstable substrates. The etcher's automatic layer-by-layer deposition capabilities make it easy to tailor the layer thickness of targeted structures. INDY PLUS B-M is an advanced etcher offering superior performance in a compact and user-friendly package. With its powerful etching process and intuitive control systems, it makes fabricating high-precision structures easier than ever. This etcher is a great choice for today's demanding semiconductor manufacturing operations.
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