Used TEL / TOKYO ELECTRON INDY PLUS B M #293763486 for sale
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ID: 293763486
Wafer Size: 12"
Vintage: 2016
Vertical furnace, 12"
Process: Pyro
Air valve: CKD
VOS-56-101PT Heater
Process chamber
MFC, MFM: AERA
MAIN / APC: CKD
Gases: HCL, H2, O2, N2
Load lock system
Storage
4-Color signal tower
Carrier transfer
Load port: Side FFU
FIMS Port
Wafer transfer
Boat elevator
Auto shutter
Manufold scavenger
(2) Boat transfers
Boat stage
Manifold
Utility box:
WAVES Controller
GFC Display
Operation panel
Data I/O
Hardware switch
Gas unit
Cooling unit
APC controller
Temperature controller
Vacuum line
Power box:
EMO Unit
Control board
Hardware switch
Transformer
SCR Unit with controller
N2 Purge unit
RF Power
Rapid cooling unit
Pump box
Gas subsystem:
Gas supply unit
Exhaust
Vacuum line
Operating system: Linux
Power supply: 120/480 V, 3 Phase, Single phase
2016 vintage.
TEL / TOKYO ELECTRON INDY PLUS B M is an etcher / asher designed and produced by TEL Limited (TOKYO ELECTRON), a leading semiconductor equipment manufacturer. The etcher / asher offers advanced features to handle the complex requirements of advanced device fabrication. TEL INDY PLUS B-M is an inductively coupled plasma (ICP) etcher / asher designed to optimize the growth and performance of semiconductor devices. It is equipped with a precise, high-performance ICP source for the production of industry-standard, high-precision devices. The ICP source enables an intense and uniform etching process even at high etching rates. The etcher / asher features an automated plasma generator, process chamber, chamber-top control equipment, vacuum system, reactive gas delivery unit, pump and controller components. The vacuum machine is equipped with a dual-pump configuration for improved performance and reliability, as well as a gas diffusion barrier and vacuum sensor that optimize the vacuum quality. The reactive gas delivery tool enables accurate control of the etching conditions for precise etching operations. The process chamber supports multiple inlet ports for precise introduction of reactive gases, and has a variable non-uniformity compensation feature for improved process uniformity. The chamber top is equipped with a 3-level automatic auto shut off valve for increased safety during plasma exposures. TOKYO ELECTRON INDY PLUS-B-M also comes with a wide range of advanced process options, including wafer batch loading, cooling, degasification, layer transfer, and end point control (EPC). The EPC function enables precise control of the process endpoint and allows device engineers to optimize device performance. The wafer batch loading asset supports up to four wafers, enabling high throughput processes. TEL / TOKYO ELECTRON INDY PLUS B-M etcher / asher is an excellent tool for advanced semiconductor device production. It offers reliable and precise etching performance along with advanced process features for optimized device fabrication.
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