Used TEL / TOKYO ELECTRON INDY PLUS B M #9381843 for sale

TEL / TOKYO ELECTRON INDY PLUS B M is a high-performance etcher / asher designed to meet the demands of the most advanced semiconductor device fabrication. TEL INDY PLUS B-M utilizes a revolutionary liquid-phase etching process to enable precision and control over etched feature sizes and shapes. This unique feature allows TOKYO ELECTRON INDY PLUS-B-M to produce features with metal hardmasks or organic hardmasks in a matter of minutes with tight CD control. High feature quality is provided by the integration of dual non-uniform beam angle. This ensures uniform etching over large feature sizes with minimal undercutting or sidewall roughness. The process flexibility of TEL INDY PLUS B M is further enhanced by its wide range of process gases including NF3, CF4, CF4/O2, NF3/O2, SF6, and SF6/O2. This facilitates a variety of deposition techniques including Multi-Dep and Arealuzion, Polysilicon LPCVD, and Anisotropic Dry Etch, among others. INDY PLUS B-M also features proprietary substrate and platen cooling to prevent thermal damage and reduce the probability of back-etching. INDY PLUS-B-M is designed to deliver higher throughputs and reduce down time. It features a versatile sub-nanosecond pulsing capability that can be used to direct etching energy into specific process regions. This speeds up etching cycles and enables the machine to be used for a wider range of process recipes. The machine's modular design allows for rapid exchange of process modules, which boosts substrate throughput and increases the time operators can save on setup time. Finally, TEL / TOKYO ELECTRON INDY PLUS-B-M features a localized RF plasma source and integrated ion source for enhanced deposition uniformity and repeatability. The RF systems provide extended process control flexibility when compared to other etchers in the same class. In summary, INDY PLUS B M is a versatile etcher / asher that provides process flexibility, enhanced throughput and repeatable performance. Its unique liquid-phase etching process produces smaller feature sizes with tight CD control and includes adjustable beam angle and substrate/platen cooling. Its fast sub-nanosecond pulsing allows for multi-process recipes while its integrated RF and ion sources provide added precision. This advanced etcher / asher is ideal for production of complicated semiconductor devices.