Used TEL / TOKYO ELECTRON Indy #293627658 for sale

TEL / TOKYO ELECTRON Indy is an etcher / asher equipment manufactured by TEL that is designed for high production rate and precision etching processes in the semiconductor, MEMS, and nanotechnology industries. The system enables etching of critical features with high accuracy and is equipped with automated process control features for improved stability and reliability. TEL Indy Asher has a dual mode process chamber design, with top and bottom gas distribution for optimal process flexibility. The upper process chamber is used for the deposition process and is equipped with an RF generator, a shower nozzle and a heated coil. The lower chamber is used for etching and is equipped with an RF generator and a shower nozzle. This allows for simultaneous process control and monitoring of both deposition and etching, improving process repeatability and reproducibility. TOKYO ELECTRON Indy Asher can handle 200mm and 300mm wafer sizes, as well as special sizes such as 4" or 8". The unit is also equipped with intelligent load control chambers that can maintain stable process conditions and reduce particle generation. It also provides support for both linear and nonlinear etching processes. Indy Asher machine is equipped with high-precision motion control systems such as high-speed stage, autofocus and XYZ-rotational stage for precise positioning. A range of automated process recipe control features help increase process throughput and improve product quality. It also features a touch panel for process monitoring and control as well as an advanced data storage tool for job tracing and production records. To ensure process safety and repeatability, TEL / TOKYO ELECTRON Indy Asher is equipped with process & fault diagnostics, temperature control systems and wafer-by-wafer process control. The asset is also compatible with a range of different gases, including NF3, CF4 and NH4ClF to enable multi-layer etching and deposition. Overall, TEL Indy Asher is designed to provide sophisticated process capabilities, accurate and repeatable etching processes and reliable process control. It is perfect for advanced MEMS, semiconductor and nanotechnology applications that require precision etching.