Used TEL / TOKYO ELECTRON Indy #293758841 for sale
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ID: 293758841
Wafer Size: 12"
Furnaces, 12"
LPRO
Nitride
Atomic Layer Deposition (ALD)
2009-2013 vintage.
TEL / TOKYO ELECTRON Indy is an etcher or asher, which is a device used to striate and create patterns on various surfaces. It is widely used in the microfabrication and nanofabrication of semiconductor, photolithography, data storage, and a variety of other materials. TEL Indy is built with a two-stage scanning system. The first stage is a high-resolution etching and ashing unit, and the second stage is a low-resolution etching and ashing unit. In addition, it can also be used for cleaning and thin film deposition processes, such as sputter etching deposition. TOKYO ELECTRON Indy also has the capability to perform in situ cleaning, meaning that the device does not have to be stopped for manual cleaning. This versatile machine has a large number of features that allow for precise control over etching parameters and processes. Indy includes a set of smart etching and cleaning algorithms that enable the easy and accurate selection of the appropriate etching conditions. It also gives users the ability to specify the desired number of scans, depth of etching, etch rate, and the etching environment. This system also offers several levels of computer-aided design to further customize the etch characteristics and parameters. The data collected by TEL / TOKYO ELECTRON Indy is updated in real-time, which allows users to store and monitor etching results over a longer period of time. This data can be used to monitor the process over a long period of time, in order to detect any unwanted fluctuations in process parameters. As mentioned before, TEL Indy can also be used to perform sputter etching and deposition. In sputter etching, a small area of the surface is bombarded with ions of a chosen gas. This impacts the target material, causing particles to break apart, creating a thin film of material on the surface. TOKYO ELECTRON Indy is a powerful etching tool that allows for precise control over etching processes. With its powerful features and excellent precision, this system can help microfabrication and nanofabrication labs easily achieve their desired results.
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