Used TEL / TOKYO ELECTRON Indy #9311326 for sale

TEL / TOKYO ELECTRON Indy is an etcher/asher designed to rapidly etch and aspherize large quantities of materials. This equipment is constructed with a poly-silicon layer deposition chamber, providing efficient wafer processing throughput. This chamber can be modified to etch a wide range of deposition materials, such as silicon, germanium, and aluminum oxide. The automation equipment of TEL Indy is designed to quickly and accurately control the etching process, enabling manufacturers to save time and improve accuracy. The wafer transfer station is also incorporated, which can load up to 100 wafers and place them directly to the appropriate etch module. This allows for quicker wafer processing than manual transfer systems. TOKYO ELECTRON Indy is a powerful etching platform with superior control over the etch process. It utilizes ground-breaking and leading-edge etching technology to consistently etch materials at high speeds. The process control system offers precise etch depth measurements, ensuring manufactures can create an accurately etched and aspherized product. Its hardware is integrated in a compact machine, offering extensive wafer processing capability. The built-in uniformity control unit ensures this equipment will provide improved and consistent substrate performance. This machine is able to help eliminate errors and time intensive processes. The engineering of Indy line offers a robust etch chamber that can accommodate the pressure requirements specific to the etching process. The chamber's bottom plate is designed to be perfectly closed and negligible mechanical leak will occur. The etch gas inlet mode closely follows the process required in the design of a single wafer etcher. The injection of etch gas into the chamber is controlled by the included etch supplies, enabling an optimum process. This tool also employs complete exhaust filtration, allowing for the use of clean etching gas. Overall, TEL / TOKYO ELECTRON Indy etcher/asher is a powerful, efficient, and reliable tool that is used to rapidly etch and aspherize large quantities of materials. The automated process control asset helps to save time, improve accuracy, and reduce errors. The device is built with a poly-silicon layer deposition chamber, which offers efficient wafer processing throughput. The etch gas inlet mode and complete exhaust filtration also contribute to the device's performance. All of these features combined make it a great choice for etching and aspherizing materials of all kind.