Used TEL / TOKYO ELECTRON Indy #9379783 for sale

TEL / TOKYO ELECTRON Indy is an etcher/asher which provides precise and repeatable etching and ashing processes in the semiconductor indutry. It is a low-pressure, rapid thermal Chemical Vapor Deposition (CVD) etcher/asher with a closed loop control equipment designed to reduce break-throughs in etching steps. TEL Indy is designed for a range of processes including: etching and ashing, gate dielectric etching, metal etching, CMP removal, SiO2/SiN etching, and transistor gate oxidation. TOKYO ELECTRON Indy features a high degree of automation and temperature control, allowing for accurate etching and ashing processes. It features a high degree of plasma uniformity across multiple wafers, and also provides both Time-Based and Endpoint control options. Indy's CVD etching/ashing plasma chamber can accommodate up to twenty-five wafers per process, with a wide range of process parameters to meet user requirements. TEL / TOKYO ELECTRON Indy's advanced LDE (Learn-Data-Execution) software allows the user to customize etching and ashing processes by adjusting process parameters to fit user-defined requirements. The system automatically stores the optimum process recipe in a database, allowing for rapid switching between processes and repeatable results with minimal user input. TEL Indy utilizes a gas delivery unit which allows for precise flow control and monitoring of all CVD etching/ashing gasses. This machine also allows for the introduction of inert gasses into the chamber to lower reflective deposition. The etcher/asher also features a user-friendly, easy-to-use graphical user interface (GUI) which provides process data in an intuitive format and allows for troubleshooting and monitoring of process parameters and throughput. Overall, TOKYO ELECTRON Indy is an advanced etcher/asher tool designed to provide efficient and precise processes for the semiconductor industry. Its advanced LDE software, closed loop control asset, high degree of automation and temperature control, as well as gas delivery model, make it an ideal equipment for a variety of semiconductor etching and ashing processes.