Used TEL / TOKYO ELECTRON Indy #9379806 for sale

TEL / TOKYO ELECTRON Indy
ID: 9379806
Wafer Size: 12"
Furnace, 12".
TEL / TOKYO ELECTRON Indy is an etcher/asher designed for complex advanced semiconductor processing. The equipment is capable of processing wafers up to twelve inches in diameter and can handle a variety of applications such as photo- and electrochemical deposition, etching, and resist stripping. It is loaded with automated process control functions and can accommodate up to four wafers at a time. The etcher operates by using a laser-induced discharge plasma (LIDP) source which is used to deposit material onto a substrate to form a device layer. The etcher is capable of using a variety of gases for its operations including Ar, CF4, PTFE, O2, and CHF3. The LIDP plasma source has four levels of power, which can be controlled for different etching processes depending on the application. TEL Indy also features a high-resolution control module which is used to adjust the power and gas flow. This provides more accurate process control results and enables TOKYO ELECTRON Indy to handle more complex application requirements. Indy is also equipped with an advanced safety system. This includes safety checks of the source power levels and the gas flow and pressure settings. The unit also features a passive safety valve to detect any gas leakage that might occur during operation. Furthermore, the machine comes equipped with an Interlock Device, which is designed to prevent the equipment from starting if any of the safety settings are not enabled. TEL / TOKYO ELECTRON Indy's chamber design features an innovative shape that ensures optimal uniformity, maximizing the etching process efficiency. The etcher also has a low-stripping rate which ensures that etching results are of highest quality. This low-stripping rate is also designed to prevent any contamination during the process. TEL Indy is a versatile etcher equipped with advanced features. Its modular design makes it suitable for a wide variety of etching applications. It has excellent control over etching and deposition processes and can handle complex requirements while providing superior results. The tool is built with safety features to maximize safety during operations and prevent contamination. It is sure to provide reliable and precise results.
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