Used TEL / TOKYO ELECTRON MB2-730 HT-HT #293734292 for sale

ID: 293734292
Wafer Size: 8"
Vintage: 1996
CVD System, 8" (3) Chambers WSi Process 1996 vintage.
TEL / TOKYO ELECTRON MB2-730 HT-HT is a high-performance etcher/asher equipment designed for advanced semiconductor manufacturing processes. This state-of-the-art equipment offers precise control over plasma processing parameters to achieve uniform and repeatable results, making it an ideal choice for high-volume production environments. TEL MB2-730 HT-HT features a dual-chamber configuration, with a process chamber for plasma etching and an ashing chamber for resist stripping. This versatile design allows users to perform a variety of processes without the need for multiple tools, improving efficiency and reducing production costs. One of the key features of TOKYO ELECTRON MB2-730 HT-HT is its high-temperature capability, which enables processing at temperatures up to 350°C. This capability is essential for certain applications that require elevated temperatures to achieve optimal process performance. With the ability to control the temperature within the process chamber, users can customize the thermal environment to suit their specific requirements. In addition to its high-temperature capability, MB2-730 HT-HT offers advanced plasma generation technology for precise and uniform processing. The system is equipped with a high-density plasma source that delivers a stable and uniform plasma across the wafer surface, ensuring consistent process results from wafer to wafer. TEL / TOKYO ELECTRON MB2-730 HT-HT also features a range of process gases and chemistry options to accommodate a wide variety of applications. Users can select from a comprehensive list of process gases, such as fluorine-based and oxygen-based chemistries, to tailor the etching/ashing process to their specific needs. Additionally, the unit is equipped with advanced gas flow control technology for precise regulation of gas flow rates and mixtures, allowing users to optimize process conditions for maximum performance. To further enhance process control and repeatability, TEL MB2-730 HT-HT is equipped with advanced monitoring and control systems. Real-time process monitoring tools allow users to observe key process parameters, such as temperature, pressure, and plasma characteristics, in real-time, enabling rapid adjustments to ensure optimal process performance. The machine also features sophisticated recipe management capabilities, allowing users to store and recall process recipes for consistent results. Maintenance and serviceability are key considerations in semiconductor manufacturing equipment, and TOKYO ELECTRON MB2-730 HT-HT is designed with these in mind. The tool features a modular design for easy access to critical components, simplifying maintenance and reducing downtime. Additionally, TEL offers comprehensive service and support programs to ensure maximum uptime and productivity for users of MB2-730 HT-HT asset. In conclusion, TEL / TOKYO ELECTRON MB2-730 HT-HT is a high-performance etcher/asher model that offers precise control, advanced plasma technology, and high-temperature capabilities for a wide range of semiconductor manufacturing applications. With its versatile design, superior process control, and robust serviceability, TEL MB2-730 HT-HT is an ideal choice for semiconductor manufacturers seeking high-quality and reliable plasma processing solutions.
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