Used TEL / TOKYO ELECTRON MB2-730 #9396124 for sale

TEL / TOKYO ELECTRON MB2-730 is an etcher/asonator for use in lithographic processes. It is utilized in the production of photomasks for the manufacture of advanced semiconductors. This precise etcher operates by utilizing an abundance of chemistries in a highly controllable environment. TEL MB2-730 is designed for industrial applications such as etched patterns on semiconductor wafers and substrates. TOKYO ELECTRON MB2-730 is capable of performing a variety of tasks including dry and wet etching, as well as polyimide patterning and ablation. This machine is capable of producing high quality results, thanks to the adjustable parameters the user can program into the device. It also features a two-stage etching process, wherein the second stage etch chemistry significantly improves etching precision. This feature also provides the user with the ability to perform multiple etching processes concurrently. MB2-730 has an open architecture with different levels of automation. This enables the user to customize the equipment and make the most of the device's capabilities. TEL / TOKYO ELECTRON MB2-730 is designed to adhere to the repeatable, ultimate INTEK process control, and the user can create programs for a wide range of chemical combinations for specific etching processes. In addition, TEL MB2-730 includes a dual chamber, enabling the machine to perform a number of processes simultaneously. This includes front level holograms, direct writing, and contact or contactless lithography. It also comes equipped with a multi-dimensional substrate holder, ensuring that users can achieve consistently high-quality results. TOKYO ELECTRON MB2-730's high-performance system is adaptable to a variety of substrates including quartz, alumina, sapphire, polysilicon, and gallium arsenide. This unit is designed to provide users with the ability to etch clean patterns on the most challenging substrates. Overall, MB2-730 is a precise, high-performance etcher/asonator designed to produce high quality etching results, regardless of the substrate. It utilizes adjustable parameters to provide users with the ability to perform multiple etching processes concurrently with dual chamber capability, and is backed by INTEK process control. This highly customizable machine is adaptable to a range of substrates, and provides users with the ability to achieve consistently high-quality results.