Used TEL / TOKYO ELECTRON MB2-730 #9398831 for sale

TEL / TOKYO ELECTRON MB2-730 is an advanced etcher, specifically designed for Plasma Enhanced Chemical Vapor Deposition (PECVD) applications. This etcher is perfect for operations that require precise control over the fluorine and sulfur precursors used in the etching process. The equipment includes a gas box, two quartz chambers connected to each other, and a load lock chamber. It also includes a load lock with wafer transfer and a high-vacuum pumping package, allowing it to achieve a base pressure of below 6 mTorr. TEL MB2-730 is equipped with TEL proprietary Advanced Plasma Source (APS) that features a high-efficiency, low-noise plasma multi-channel configuration. This system allows for precise control over the precise deposition parameters, yielding products of the highest quality. It is also designed for reproducible and uniform etching processes. It is capable of etching various substrates, such as silicon wafers, thin films and amorphous glass. TOKYO ELECTRON MB2-730 employs a hybrid gas control unit, which includes a gas mixing box, a mixing chamber, and a turbo pump package with a high-flow capacity. This configuration gives users the flexibility to define the precise composition of etching gases, allowing them to precisely tailor the etching process. The machine also includes a Quartz Crystal Monitor (QCM), allowing for accurate control of the deposition process. MB2-730 is designed for reliable, long-term performance. The tool features a self-diagnostic feature that allows users to predict any potential maintenance needs, as well as an automated cleaning cycle to reduce maintenance time and effort. Additionally, the asset includes safety features such as over-pressure alarms and temperature limits, to ensure operator safety. In conclusion, TEL / TOKYO ELECTRON MB2-730 is an advanced etcher perfect for operations requiring precise control over the fluorine and sulfur precursors used in the PECVD process. It is equipped with TOKYO ELECTRON proprietary Advanced Plasma Source (APS) and a hybrid gas control model offering users the flexibility to accurately tailor the etching process according to their needs. TEL MB2-730 also includes safety features such as over-pressure alarms and temperature limits, as well as a self-diagnostic equipment, making it a reliable and safe option for etching applications.