Used TEL / TOKYO ELECTRON ME-450II #293594208 for sale

TEL / TOKYO ELECTRON ME-450II is a highly advanced, state-of-the-art etcher/ asher. It is developed and manufactured by TEL and has a wide range of applications and uses in industry. TEL ME-450II is a direct plasma etching equipment that features a multi-chamber design, providing the user with a stable and consistent environment for patterning and etching. The system's chamber is optimized for the etching of silicon, the substrate most commonly used in the electronics industry. It is also suitable for other materials, such as glass and quartz. TOKYO ELECTRON ME-450II utilizes an optimized Multi-Wavelength Plasma Source to deliver high etching rate, a large process window, and exceptional selectivity. The unit's high plasma density, low substrate charging, and superior lag control enable superior etching performance on a wide range of substrates and films. The machine's chamber design utilizes multiple sources and etching gases for maximum process flexibility. ME-450II comes standard with a fixed cathode, cylindrical cathode, and planar electrodes for variety of process flows including reactive ion etching (RIE). The planar electrodes can be used to paddle ac or pulsed dc power to substrates for superior pattern fidelity. Additionally, the tool's automatic gas delivery and control allows uniform gas usage and total process control. TEL / TOKYO ELECTRON ME-450II also includes a variety of miscellaneous tools and features to ensure good process performance and yield. Examples of such features are an automated substrate positioner and a low-reflection substrate holder. TEL ME-450II also makes use of durable ceramic engineering materials to minimize downtime and optimize maintenance. TOKYO ELECTRON ME-450II is equipped with a variety of alarms and safety features to ensure the safety of personnel and process stability. Real-time diagnostics are provided to allow users to quickly monitor and modify processes without stopping the asset. ME-450II is designed to integrate easily into existing production environments and is compatible with a variety of substrates and films, making for a production model that is relatively quick to set up and easy-to-use. In summary, engineering and software advancements along with a combination of unique etching sources and gas flow control, make TEL / TOKYO ELECTRON ME-450II an ideal tool for patterning and etching. Its advanced features, combined with its multi-chamber chamber design and associated process tools, ensure repeatable, reliable, and high-quality results.