Used TEL / TOKYO ELECTRON ME-450II #9267385 for sale

TEL / TOKYO ELECTRON ME-450II is an etcher/asher machine designed for providing reliable etch/ash processes in semiconductor devices. It is a state-of-the-art machine, equipped with the latest technologies. It is capable of performing processes at low temperatures, with high precision and accuracy, and with high throughput. The machine is equipped with a high-resolution imaging equipment, which allows for high-precision imaging. It provides a real-time feedback, which allows for quick adjustment of parameters. It is capable of performing etch/ash processes on various materials, such as thin dielectrics, polyimide, silicon dioxide, and various other substrates. Furthermore, it supports a wide range of etch/ash process chemistries. TEL ME-450II has a user-friendly interface, and requires minimal setup and maintenance. It is able to work accurately and consistently, even with changing heights and surface topographies, thanks to its auto-balance feature. The auto-balance feature enables the user to set up the etching parameters for each job, based on the substrate, surface texture, material type, and height. The machine has an integrated, well-validated Process Control System (PCS) which ensures the accuracy of the etch/ash processes. The unit includes an etch uniformity control machine, temperature control tool, and pressure control asset. The PCS allows users to monitor and control the parameters of each etch/ash process, in real-time. This enables users to achieve the optimal results, each and every time. In addition, TOKYO ELECTRON ME-450II has advanced plasma process control technology, referred to as TEL-MPT (Multi-Path Tuning) technology. This technology combines the use of two independent etching paths, and uses different pressure, temperature, and RF power levels for each path. The multi-path tuning technology enables the user to achieve precise etch/ash results. ME-450II is an advanced etcher/asher machine, combining the latest technologies to allow for the highest precision and accuracy when performing etch/ash processes. It is a reliable tool for semiconductor device manufacturing and is capable of performing a wide range of etch/ash processes, even with changing heights and surface topographies.