Used TEL / TOKYO ELECTRON ME-600P2 / ME-600IR #9382344 for sale

TEL / TOKYO ELECTRON ME-600P2 / ME-600IR is an etcher / asher designed for precision etching and ashing of a wide variety of materials, including silicon, quartz, gallium arsenide, gallium nitride, copper, aluminum, titanium, tungsten, and steel. TEL ME-600P2 / ME-600IR features an advanced coarse/fine processing module, capable of simultaneously processing up to 12 wafers at once with a total processing area of up to 1,310 sq cm. It is also equipped with an independently controllable quartz furnace, allowing temperatures up to 1,350°C and offering a high level of process stability. The unique Auto Slope Technology allows for constantly updating etch profiles for uniform etch/ash depth, while improved monitor wafer loading and unloading systems ensure easy operation. The ME-600P2 features a 13 different plasma gas sources (helium, argon, sulfur hexafluoride, carbon tetrafluoride, hydrogen fluoride, oxygen, nitrogen, ammonia, silicon, hydrogen silsesquioxane, hydrogen borane, chlorine, and boron trifluoride) that enable a wide range of etching and ashing processes, while a single substrate etch/ash chamber allows for a flexible substrate transfer system. This etcher / asher can also be easily integrated into automation systems, making it ideal for complex, high-volume production. In addition, the ME-600IR features an additional line of IR lamps that can be used for ashing/drying processes. TOKYO ELECTRON ME-600P2 / ME-600IR is an excellent solution for a wide range of etching and ashing applications in precision industries such as microelectronics and semiconductor manufacturing. With its advanced features and outstanding process stability, it is the ideal choice for achieving high-quality results with a minimal amount of processing time.