Used TEL / TOKYO ELECTRON Metal CVD Chamber for Triase+ Ti/TiN #9294228 for sale

TEL Metal CVD Chamber for Triase+ Ti/TiN is a sophisticated etcher/asher designed to deposit Ti/TiN over large areas with high reproducibility. This piece of equipment is made of stainless steel, enabling it to withstand extreme temperatures and pressure levels. It also has a closed-loop flow equipment that ensures high purity, homogeneity, and repeatability. The system includes a unique gas center mechanism which provides compound gas flow at the film and gas blowoff levels downstream from the etching chamber. This ensures good quality deposits over entire wafer surfaces. The chamber also comes with a modified source unit that contains up to five gas channels and is employed for thin-film formation. Furthermore, the etching chamber includes a temperature controller to raise and stabilize temperature prior to Ti/TiN deposition. To effectively operate this machine, the operator needs to understand the principles of Process Controller. This device allows manual setup of all pre-processes, such as pressure, temperature and feed gas flow rate. It also enables the operator to adjust the process parameters dynamically, in order to achieve optimal performance. When using this tool, the operator needs to be sure to open the front cover and the side cover of the chamber before switching on the process controller. A uniform temperature across the entire chamber is then requested, usually by first introducing the process gas. The gas flow rate has to be precisely monitored to ensure distributive gas pressure and prevent overpressuring. This asset is also equipped with a heated quartz window which can be operated by the same master power source from the etching chamber. It is important to set the temperature of the quartz window for the etching parameters, as well as for preventing contamination. Additionally, the operator needs to regularly check the positioning of the quartz window, in order to prevent any possible damage and to assure the highest performance from the model. In short, TOKYO ELECTRON Metal CVD Chamber for Triase+ Ti/TiN is a powerful etcher/asher that can help deliver high reproducible deposits over large areas. It is a complex equipment that requires knowledge regarding process controllers, temperature control and quartz window positioning. Precise and regular monitoring of all related parameters is necessary to obtain best results.