Used TEL / TOKYO ELECTRON SCCM Shin #293705863 for sale

TEL / TOKYO ELECTRON SCCM Shin is a semiconductor etcher/asher equipment designed for advanced applications in the field of semiconductor etching and ashing. This system consists of a single, central control unit, which controls all of the components. These components include a Central Processor Unit (CPU), an Oscilloscope, a Vacuum Chamber, an Ashing Chamber, a Wafer Mapping Machine, a Heated Gas Tool, and a Wafer Transport Asset. The CPU unit in this model is responsible for controlling all of the other components in the equipment. This means, is responsible to receive, interpret, and execute commands sent by the user through the computer interface. It also reads data from the sensors and parameters that determine the etching and ashing process. The parameters are entered into the software with the help of a user-friendly graphical menus. All the required data is then stored and processed within the software. The Oscilloscope acts as an interface between the CPU and the other components of the system. It is responsible for displaying the parameters and readings of the various components in the unit such as the vacuum chamber or the heated gas machine. The Vacuum Chamber in TEL SCCM Shin acts as a vessel to contain the environment in which the etching / ashing process is carried out. This chamber can be configured to create various levels of vacuum and/or atmosphere within it depending on the type of process required. The Ashing Chamber of the tool is responsible for the removal of unwanted layers on the semiconductor wafer and consists of a chamber and a gas supply asset. The chamber contains a heater that is used to heat up the gas to the desired temperature. The gas is then injected into the chamber and the process of removing unwanted layers on the wafer takes place. The Wafer Mapping Model of TOKYO ELECTRON SCCM Shin consists of a beam mapping equipment and a wafer transport system that enables the wafer to be accurately mapped and precisely transported into the vacuum and/or ashing chambers. This is vital for ensuring the accuracy of the etching or ashing process. The Heated Gas Unit of the machine is designed to provide a continuous supply of heated and/or cooled gases such as nitrogen, oxygen, or argon to the chambers. This enables the tool to carry out processes faster and with greater precision. Finally, the Wafer Transport Asset of SCCM Shin is designed to transport the wafer into and out of the chambers accurately and with great precision. This transport model consists of a linear motor that is used to control the precise movement of the wafer and is housed in a parallel mounted guide rail. In summary, TEL / TOKYO ELECTRON SCCM Shin is a highly advanced etching and ashing equipment used for semiconductor wafers. Its various components each handle a specific task within the system, allowing for accurate and precise etching and ashing outcomes.