Used TEL / TOKYO ELECTRON SCCM Shin #9235178 for sale

TEL / TOKYO ELECTRON SCCM Shin
ID: 9235178
Wafer Size: 12"
Vintage: 2007
Dry etcher, 12" 2007 vintage.
TEL / TOKYO ELECTRON SCCM Shin is a high-performance etcher/asher designed for advanced technology semiconductor fabrication processes. It supports a wide range of wafer sizes (ranging from 5'' wafers up to 150mm) and is able to cope with the requirements of both dry and wet etching processes, providing fast and reliable results. The equipment is designed to be compact and easy to use, featuring a color touchscreen display. It has a modular architecture, making it simple to adapt and expand the system to changing customer needs. It is equipped with a large array of process chambers and internal gas lines, allowing it to be easily configured with both single/multi-step etching recipes. TEL SCCM Shin is additionally equipped with a chamber cleaning unit based on the Reactive Ion Etch (RIE) principle. This machine uses a highly accelerated plasma beam composed of compressed gases to effectively remove contamination from the interior of the chambers without compromising the structured surface of the wafer. The tool also features a wide variety of options such as a thermocouple monitor for controlling process temperatures, a CP-MS detector for detection of particulate levels, and a high-sensitivity micrometer for accurately measuring the wafer thickness in-situ. Furthermore, it can be configured with special heating and cooling structures for optimized process control. TOKYO ELECTRON SCCM Shin is capable of providing high uniformity over a wide range of processes, including HF-based etching, CMP, thin-film etching, and reactive ion etching. It is highly reliable and efficient, making it an ideal choice for the fabrication of advanced technology semiconductor devices.
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