Used TEL / TOKYO ELECTRON SCCM Shin #9241291 for sale

TEL / TOKYO ELECTRON SCCM Shin
ID: 9241291
Wafer Size: 12"
Vintage: 2007
Systems, 12" 2007 vintage.
TEL / TOKYO ELECTRON SCCM Shin is an etcher/asher designed to produce high-quality, low-cost microelectronic devices by combining photomask batch processing with plasma etching. This advanced technology allows the production of highly complex device structures in a single machine. The result is optimal yield, low material costs, and high cycle times. TEL SCCM Shin operates by exposing the wafer to reactive ion etchants, which are then deposited onto the wafer. This process is conducted in batches and enables controlled etching of intricate features with high accuracy and repeatability. Additionally, the machine comes with an on-board computer that allows for easy adjustment of etching parameters such as pressure, power, and etchant volume, allowing the operator to customize the etching process to suit their specific needs. The precision of TOKYO ELECTRON SCCM Shin makes it an ideal choice for producing high-resolution features. The etching depth and width are both adjustable and range from 0.5-25. Therefore, it can be used to create geometries and channels as small as 0.5 microns across. The high accuracy and repeatability of the plasma etching process ensures that intricate features are accurately replicated even with different wafer batches. SCCM Shin can also be used as an asher. This involves evenly exposing the wafer's surface to a controlled dose of oxygen which can be used to oxidize the wafer's surface to improve its electrical characteristics. Furthermore, the design of TEL / TOKYO ELECTRON SCCM Shin ensures minimal contamination and cross-contamination. This allows for reliable device production even in ultra-sensitive microelectronic applications. TEL SCCM Shin is a cost-effective solution for producing high-quality microelectronic devices. It is user-friendly with an easy-to-use graphical interface, has a high throughput, and comes with an integrated database that stores the etching parameters. Furthermore, it supports a range of substrate materials, making it a versatile and reliable etcher/asher.
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