Used TEL / TOKYO ELECTRON SCCM Shin #9261824 for sale

TEL / TOKYO ELECTRON SCCM Shin
ID: 9261824
Wafer Size: 12"
Vintage: 2006
Etcher, 12" 2006 vintage.
TEL / TOKYO ELECTRON SCCM Shin is an etcher / asher equipment used in semiconductor and compound semiconductor manufacturing processes. It is designed to precisely control deposition and etching of thin metal layers, and is ideal for cutting complex shapes and creating various nanostructures. This etcher / asher system is ideal for a range of research applications, such as micro- and nano-electronics, microfluidics, photovoltaics, optoelectronics, and biology. TEL SCCM Shin is a gas-driven etcher/asher unit comprising a shower head with multiple gas inlets and a precise control machine. Its main components are the shower head, temperature controlled etch chamber, inlet lines, and a dry gas and ejector tool. The shower-head consists of multiple gas-inlets in which different gases can be introduced for etching or ashing at different temperatures, thus providing precise temperature control. The shower-head is surrounded by an inert atmosphere chamber to prevent reaction between the substrate and gas. The temperature-controlled etch chamber is designed to provide excellent uniformity and stability. It is equipped with inlet lines that allow various gases to be introduced, allowing the etcher/asher to provide a wide range of Etching and Ashing effects. The etcher / asher asset also features a Dry Gassing Model (DGS) and Ejector Equipment (ES). The DGS is designed to quickly deposit metal layers on the substrate, and features both quartz and tungsten electrodes, with the option of using up to four electrodes. The ES is used for etching thin films, and allows Fine-Target Etching and Ion beam Etching. It is equipped with a high-frequency generator, an etching gun, and a substrate holder. TOKYO ELECTRON SCCM Shin etcher / asher system is capable of etching and depositing metal layers with high precision and excellent uniformity. It can also be used for patterning a variety of substrates with high-precision etch features. This unit is extremely versatile and can be used for various applications, making it an ideal choice for researchers in semiconductor and compound semiconductor manufacturing applications.
There are no reviews yet