Used TEL / TOKYO ELECTRON SCCM TE #9206140 for sale

TEL / TOKYO ELECTRON SCCM TE is a single wafer etcher/asher equipment designed for semiconductor manufacture. The system provides a single source for advanced etching/ashing processes for MEMS, multiple wafer fabrication, MEMS/MMIC/Compound Semiconductor device fabrication. It offers superior process control and uniform etch results and dielectric conformal coatings uniformity. The unit features automatic process control, in-situ closed-loop monitoring, and Pattern Generator sequential control for improved wafer throughput. TEL SCCM TE is engineered to provide superior plasma processing performance and includes ICP SiO₂ etch, HCl etch, O₂ /Ar reactant gases and a chemical-mechanical wafer polishing (CMP) capability. The machine is precise and repeatable, and is equipped with advanced tools such as a high-resolution switching distance (HRSD) and planarization tool for planning and etch control, a wafer rotation asset, advanced forward & reverse RF power delivery, and real-time tank pressure control for improved plasma spike protection. Additionally, the model includes a spray heating unit and an innovative self-cleaning equipment to assist in reducing the impact of contamination on surface topography. TOKYO ELECTRON SCCM-TE is equipped with an in-situ Faraday shield, enabling the system to process TEL own line of resist-loaded wafers, enabling multi-process integration across various etching/ashing steps. The unit also provides a wide range of customizable processing parameters such as etching parameters, alignment accuracy, dielectric etch-back, substrate patterns and process recipes to enable high-performance, high-yield production. In addition, SCCM-TE offers advanced automation capabilities such as multi-recipe management, PC-based instrumentation control, wafer tracking, GDS/GDSII data management, and a quality control monitor. The machine is designed for use in 24/7 operation, and provides superior speed and reliability. Integrated self-diagnostics, remote connectivity, and easy maintenance features make this tool an ideal choice for process-intensive applications. The asset's innovative engineering is combined with the highest-grade materials for reliable performance in demanding conditions. The use of vacuum-sealed welded chambers, high-purity gas systems, and other advanced components ensure excellent repeatability and long-term stability. TEL SCCM-TE offers the highest level of performance and ease of use for both research and production semiconductor applications.