Used TEL / TOKYO ELECTRON Tactras Vesta NV3 #293603576 for sale
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ID: 293603576
Wafer Size: 12"
Vintage: 2018
Polysilicon etcher, 12"
(2) AC Distribution boxes
Main frame:
Loader module
(3) Load ports
Vaccum transfer module:
Transfer module
(2) Loadlock modules
Process module:
PM1: Vesta NV3
PM2: Vesta NV3
PM5: RF-3
PM6: Vesta NV3
(3) HF RF Power supplies
(4) Gas boxes
(3) RF Generators
(3) TMP Controllers
2018 vintage.
TEL / TOKYO ELECTRON Tactras Vesta NV3 is a reliable, efficient, and precise plasma etcher/asher that is used for a wide range of applications. TEL Tactras Vesta NV3 operates by using the 'Plasma Enhanced Etching' technique, which uses high-temperature, high electric field and high-energy ions. This method of etching enables precise etching on precise patterns, as well as wide range of deep etching/ ashing. TOKYO ELECTRON Tactras Vesta NV3's interface is user-friendly, allowing for precise and easy control of etching parameters. It also includes an intuitive graphical user interface that reduces production cycle times and improves productivity. The etcher/ asher supports multiple substrate sizes, ranging from 200mm to 300mm, making it versatile and ideal for a variety of semiconductor production processes. The NV3 also features an advanced furnace module that helps to reduce uneven heating and helps uniform etching. In addition, it features a pump system that features reduced consumption of gases, reducing the cost associated with etching processes. The NV3 is equipped with SEGARD (Super Etching Gas Analysis Data Recording) that allows for accurate recording of gas distribution on the etching surface. This helps to improve the accuracy of etching patterns and make sure the uniformity of the etching process. Some of the features offered by the NV3 include automatic substrate temperature control, auto-outlet temperature control, and auto trench formation. These features are important as they help to keep the substrate temperature constant, as well as help to improve process uniformity. The NV3 is also capable of simultaneous etching of up to 10 wafers, drastically increasing productivity and throughput. In conclusion, Tactras Vesta NV3 plasma etcher/asher is a high-precision, reliable etcher/asher used in a variety of production processes. Such features enable uniform etching, faster throughput, and excellent uniformity on a wide range of substrate sizes.
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