Used TEL / TOKYO ELECTRON Tactras Vesta #9221865 for sale

TEL / TOKYO ELECTRON Tactras Vesta is an etching / asher equipment designed for use in semiconductor device fabrication. The system is composed of a process chamber, a vacuum chamber and a controller unit. The process chamber contains multiple layers of production containers, wherein reactive gases are cooled and circulated. The etching / ashing processes are then achieved by supplying the gases onto the substrate. The process of etching/ashing is done using high-frequency plasma, generated by several RF generators, and is applied to the substrate from all four sides. The unit is engineered to be a single-wafer reactive ion etcher (RIE), which makes it a suitable tool for precise etching processes with sub-micron accuracy. It is also a vacuum-based machine, allowing users to achieve a modest number of process steps while conserving the quality of the substrate in its pre-process condition. The vacuum chamber, which is connected to the process chamber, works to reduce the etch rate fluctuations due to environmental gas contamination between process recipes. Further, the tool comes with TEL Tactras Vesta controller unit, which provides a user-friendly interface, allowing users to easily configure and store different etch and ashing recipes. The user can tweak and store up to three etch recipes and up to three ashing recipes according to their specific needs. The asset also offers enhanced process stability, as it utilizes a special cooling device that helps maintain the temperature within the vacuum chamber, as well as a low pressure injector. All these features make TOKYO ELECTRON Tactras Vesta an excellent etching/asher tool for semiconductor fabrication processes. It is a user-friendly model, with many features that make it ideal for micro-fabrication processes. The equipment offers improved throughput and better etch uniformity of the substrate, which helps maximize yields, reduce cost, and improve the quality of the integrated circuits.