Used TEL / TOKYO ELECTRON Tactras Vesta #9225714 for sale

TEL / TOKYO ELECTRON Tactras Vesta is an advanced etching/ashing equipment designed for use in various advanced processes. Its ultra-fine dry etching capabilities provide highest-resolution patterning and smallest feature sizes down to 10nm, while the ashing capabilities provide superior etching performance and minimum slurry consumption. TEL Tactras Vesta can be implemented to process a broad range of materials, including standard Si, SiN, SiO2 and SiON films, as well as high-k dielectrics and advanced material synthesis. The system features dual-gas inlet control for precise dose control and process uniformity. It also includes an advanced sensor unit for accurate real-time etch depth control to ensure precise results. TOKYO ELECTRON Tactras Vesta etching unit utilizes a combination of electron cyclotron resonance (ECR) and lateral RF (LRF) plasma. The ECR plasma is used for deep etching, while the LRF plasma is used to perform bulk etching. Tactras Vesta is equipped with a programmable chamber wall to optimize the etching process. The chamber wall can be configured to provide an optimum reaction environment for each material that is processed within the machine. TEL / TOKYO ELECTRON Tactras Vesta also features hydrogen, chlorine, and sputtering gases, which allow it to process a wide variety of surfaces and processes. Additionally, the tool's stationary 500 watt RF generator is used to perform dry etching at higher process temperatures. This also allows TEL Tactras Vesta to eliminate the need for a wet etching process. TOKYO ELECTRON Tactras Vesta is a highly integrated asset offering advanced process control, high resolution and fine feature patterning, and superior process uniformity. Furthermore, its programmable chamber wall allows for full process control and precision. This makes Tactras Vesta an ideal solution for rapidly prototyping advanced structures and devices.