Used TEL / TOKYO ELECTRON Tactras Vigus RK3 #293649549 for sale

TEL / TOKYO ELECTRON Tactras Vigus RK3 is an etcher/asher designed to create 3D templates on a range of substrates, such as silicon wafers, ceramic, and glass. This advanced etcher/asher features an accurate patterning equipment utilizing a motorized stage and high-precision laser optics to deliver a consistently high-precision pattern. Using a unique combination of optics, lasers, and a motion control system, TEL Tactras Vigus RK3 is capable of creating intricate 3D templates with the utmost accuracy and repeatability. TOKYO ELECTRON Tactras Vigus RK3 is equipped with a robust 8-axis motion control unit that enables complex micro-structuring with a high degree of reliability. Additionally, this machine provides a closed-loop communication interface for interfacing with external equipment, such as computer-aided design (CAD) programs. Moreover, this tool provides a comprehensive user-friendly operation mode that allows for easy parameter changes and quick set-up. Tactras Vigus RK3 utilizes an advanced 3D programmable laser that is capable of achieving sub-micron accuracy with its high repetition rate and pulse width. This laser is powered by a galvanometer mirror that directs the light onto the substrate for precision etching. Additionally, the etcher/asher is equipped with an automated scan control asset that accurately positions the laser for high-precision patterning. TEL / TOKYO ELECTRON Tactras Vigus RK3 also features a built-in plasma generating model, which is designed to provide a low-temperature plasma environment in order to reduce the temperature of the substrate while it is being etched. This plasma generating equipment is able to achieve plasma temperature below 500°C and provides a more uniform patterning process. Finally, TEL Tactras Vigus RK3 is designed with a fully closed-loop control system that continuously monitors each of the unit's parameters, such as current, temperature, gas pressure, and laser power. This control machine provides immediate feedback on the status of the etching process, enabling adjustments to be made quickly and accurately. As a result, this tool guarantees a consistently high-precision etching procedure for a wide variety of applications.