Used TEL / TOKYO ELECTRON Tactras #9304349 for sale

TEL / TOKYO ELECTRON Tactras is a next-generation etcher / asher designed for use in semiconductor wafer fabrication. It is a cost-effective solution that can perform both etching and stripping processes. This machine features a proprietary process control equipment utilizing advanced pattern optimization algorithms and multiple metrology features. The machine has a high-speed, high-performance direct drive motor which allows for fast positioning accuracy. With its high-speed nanosecond servo system, TEL Tactras is able to etch features down to 80 nm, enabling ultra-fine patterning of the surface of a wafer. TOKYO ELECTRON Tactras achieves precise etching and stripping by controlling the process parameters such as temperature, pressure, flow and power. To ensure process stability, it incorporates a gas flow monitor, multi-zone wafer temperature control unit and multiphase process plasma control feature for precise control of ionized gas distribution. Tactras also has a multi-module capability, allowing the operator to change configurations to meet specific process requirements. It supports an open architecture to support different chemistries for research and development. It also supports the integration of third-party software, detectors, and devices. TEL / TOKYO ELECTRON Tactras features a universal power supply, a dual chamber design, and an advanced cooling machine that provide a stable environment for accurate and repeatable process results. Its five-sided chamber design provides greater flexibility in positioning wafers, allowing you to process samples from multiple directions and angles. TEL Tactras also includes an intuitive touch screen control interface which provides fast and easy process setup. The tactile navigation allows operators to easily control the parameters of the etcher, plus provides detailed visual feedback of the process. Finally, TOKYO ELECTRON Tactras is designed for long life and consistent performance. It features an efficient heat dissipation tool that eliminates the need for frequent maintenance jobs. It also supports a wide number of wafer sizes and has a built-in calibration asset for precise process control.