Used TEL / TOKYO ELECTRON Tactras #9395908 for sale

TEL / TOKYO ELECTRON Tactras, a high-resolution etching/asher equipment, is designed for use in various industries, including those within the semiconductor, aerospace, automotive, consumer electronics, and medical fields. TEL Tactras boasts a highly versatile capability to etch various thin film thicknesses of various materials from 4nm to 5µm. This precise etching system is equipped with an ultra-high resolution, adjustable etch rate control, and repeatable deep etching capabilities. TOKYO ELECTRON Tactras unit is composed of several components, including the main unit, the etch tray, and the power supply. The main unit features an open chamber design for easy access and is equipped with a six-axis robotic arm and a motorized jig lifter for precise navigation and control. The etch tray provides a long life and rugged reliability when etching at high speeds. The motorized jig lifter allows easy adjustment and constant monitoring of sidewall etching during the etching process. Tactras is designed with a highly advanced real-time, predictive etch rate control machine. This tool uses advanced controllable parameters to accurately maintain a consistent etch rate during the processing procedure. TEL / TOKYO ELECTRON Tactras' real-time control capabilities enable users to optimize etch conditions while reducing the risk of unevenness and etch damage. The powerful, low-temperature Plasma Source of TEL Tactras is capable of producing ion energy of 10 to 20 eV with an adjustable up to 30 to 40 eV. This low-temperature plasma source is capable of providing a high deposition rate and reduced process time, resulting in an increased sample throughput. TOKYO ELECTRON Tactras also utilizes an advanced gas delivery and control asset for accurate and successful etching results. Tactras offers users several optional features, such as a gas recovery model and a temperature/pressure zone monitor. The pressure/temperature zone monitor allows users to check the temperature and pressure readings from multiple points within the etch chamber. The gas recovery equipment helps reduce the amount of gas wastage and, therefore, improves process efficiency. In addition, TEL / TOKYO ELECTRON Tactras system offers extensive diagnostic tools, enabling users to pre-set etch parameters prior to the processing cycle for process optimization. Equipped with these advanced features, TEL Tactras is a versatile, powerful, and reliable etching unit for R&D and industrial environments. Its advanced control machine, low-temperature plasma source, and optional features make TOKYO ELECTRON Tactras an ideal solution for thin film etching and deep etching applications. This highly precise etcher tool is sure to provide reliable results for any etching needs.