Used TEL / TOKYO ELECTRON TE 5000 ATC #293830626 for sale

TEL / TOKYO ELECTRON TE 5000 ATC is a high-precision, multi-functional dry etcher/asher. It is ideal for a variety of applications, including photolithography, advanced etching, isolation, ramp annealing, and thermal annealing. The etcher offers a variety of features and capabilities, such as high etch rates, substrate control, clean processes, and an application design to reduce cycle times. The etcher makes use of a patented electromagnetically assisted electron beam (EMEBE) source to clean the chamber, reducing cycle times and resulting in consistent processing. The EMEBE source is also used to generate a plasma in the etch chamber; by doing so, contaminants and residues can be easily managed. The etcher includes an automatic substrate mounting equipment, allowing for quick and easy substrate placement and vacuum chamber seal maintenance. This system also includes adjustability, allowing each substrate to be adjusted independently or collectively. TEL TE 5000 ATC has controlling heat and RF systems. The RF unit can hold a diversity of frequencies resulting in simultaneous dual frequency operation, which is essential for resolving impedance and surface composition differences often encountered in processing. The RF machine can also accurately manage the temperature of the substrate and workpiece surface. The ET 5000 ATC has advanced pressure and temperature control for enhanced particle management and reduced etch duration. It features a variety of pressure levels, ranging from atmospheric pressure to sub-atmospheric pressure, and multiple safety settings for increased safety. The chamber is equipped with a variety of sensors, including IR cameras and thermocouples for monitoring temperature, pressure, and flow. The sensors provide real-time data acquisition, allowing users to monitor and adjust their parameters in real time. TOKYO ELECTRON TE 5000 ATC is an ideal choice for a variety of dry etching and ashing applications and provides excellent results with a variety of substrates and materials. The high-precision etching and annealing capabilities, combined with its advanced processes, make it an ideal tool for high-end research and production applications.