Used TEL / TOKYO ELECTRON TE 5000 ATC #9033639 for sale

TEL / TOKYO ELECTRON TE 5000 ATC
ID: 9033639
Wafer Size: 5"
Vintage: 1991
Etcher, 5" Chamber / ATC 1991 vintage.
TEL / TOKYO ELECTRON TE 5000 ATC is a high-performance etcher / asher specifically designed for polysilicon and other semiconductor processes. It is a fully automated equipment with a highly advanced particle control system and laser-based technology that offers unparalleled productivity and excellent surface finish. TEL TE 5000 ATC features an advanced multi-chamber deposition unit that consists of multiple etch tanks capable of accommodating various substrate sizes. The etch process can be adjusted according to the process recipe, which is graphic-controlled and easy to use. TOKYO ELECTRON TE 5000 ATC uses automatic thickness control (ATC) to monitor the deposition through a specialized optical machine. This technology provides users with real-time feedback regarding the film thickness and process monitoring. TE 5000 ATC also comes with advanced temperature control, which enables rapid heating and cooling of the substrate during processing. This allows for improved process consistency and enhanced deposition yield. The unit is equipped with EMC noise suppression capabilities to reduce electromagnetic interference and minimize noise levels. Furthermore, the tool incorporates a secure nitrogen supply for high-stability gas etching. Apart from its excellent etching performance, TEL / TOKYO ELECTRON TE 5000 ATC also features a powerful drive asset, which provides high-speed motion control. The motion control model allows for simultaneous operation of multiple chambers with precise substrate positioning, which significantly reduces the waiting time between process steps. TEL TE 5000 ATC also features a substrate retrieval equipment that quickly and accurately retrieves smaller substrates from the etch tanks. TOKYO ELECTRON TE 5000 ATC is an advanced etcher / asher unit that is ideal for use in the production of polysilicon and other semiconductor processes. It offers excellent performance and superior process control, as well as reduced etching time. Furthermore, the system offers secure nitrogen supply and advanced temperature control for improved process consistency, as well as electromagnetic interference (EMC) suppression for quieter operation. With its high-speed drive unit and automatic substrate retrieval machine, TE 5000 ATC is a reliable and cost-effective choice for the production of high-quality semiconductor devices.
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