Used TEL / TOKYO ELECTRON TE 5000 ATC #9098711 for sale

TEL / TOKYO ELECTRON TE 5000 ATC (etching/ashing) equipment is a semi-automated, multi-purpose, advanced etching and ashing system offering a wide range of high-performance etching and ashing processes. TEL TE 5000 ATC unit is a modular machine designed to provide superior etching and ashing performance and variability, as well as maximum productivity. The unit comes pre-built with four distinct experimental zones for simultaneous processing of multiple samples. The four processes can be completely customized to meet the individual requirements of any experiment. Additionally, TOKYO ELECTRON TE 5000ATC can be easily customized with additional modules to further extend its capabilities. The tool is powered by a precision-controlled HT-type electron gun and is capable of both etching and ashing. An intuitive user interface with touch-screen controls and real-time process monitoring makes it easy to use. It has an improved plasma generator for increased etch rates on metal substrates and a batch loader for automated loading and unloading. TE 5000 ATC is a sophisticated, highly automated tool for etching and ashing of various materials, including silicon, compound semiconductors, and metals. It is designed to produce repeatable, accurately etch and ash results if contemporary etch/ash processing requirements. TEL TE 5000ATC comes with powerful process and data management capabilities, allowing users to store and retrieve recipes and other process parameters. TOKYO ELECTRON TE 5000 ATC uses a wide variety of gases and precise delivery systems to provide for accurate and repeatable etch/ash results. Gas supplies are actively controlled and monitored to ensure a consistent and repeatable etch rate. The unique Pressure Flow Controller allows for exact pressure control of multiple gases into the chamber. Overall, TEL / TOKYO ELECTRON TE 5000ATC is a powerful, multifunctional tool for the precise etching and ashing of numerous materials. TEL advanced process features make it ideal for a wide variety of etching and ashing processes involving silicon, compound semiconductors, and metals. Its user-friendly interface and reliable process control make it an ideal solution for researchers and etching technicians who require consistently accurate results.