Used TEL / TOKYO ELECTRON TE 5000 ATC #9142638 for sale

TEL / TOKYO ELECTRON TE 5000 ATC
ID: 9142638
Wafer Size: 8"
Vintage: 1995
Oxide etcher, 8" 1995 vintage.
TEL / TOKYO ELECTRON TE 5000 ATC is a reactive ion etcher (RIE) which is used for removing layers of materials from substrate surfaces. This device has an Advanced Torch Chamber (ATC) equipment, which provides high-speed material etching and high-precision machining for a wide variety of applications. The system offers a high-rate, low-damage etching process through a combination of high-temperature hydrogen-based plasma and advanced torch chamber design. The main components of TEL TE 5000 ATC include the plasma chamber, the turbomolecular pump, and the Advanced Torch Chamber (ATC). The plasma chamber is built with an advanced slit seal construction and has a maximum etching area of 395 mm by 278 mm. The turbo molecular pump is a high-performance pump which is used to evacuate the chamber by creating a high vacuum. Finally, the ATC uses a high-temperature, high-efficiency hydrogen-based plasma to produce a powerful etching process. The unit is controlled by Computer Numerical Control (CNC) software and the software provides a range of features including process control, recipe library, alarm schemas, and data logging capabilities. The machine also comes with a temperature proportional feedback supply (TPFS) which provides an optimized etching process. TOKYO ELECTRON TE 5000ATC offers a high speed etching process which is suitable for operating at high temperatures. The device is designed for repeatable, precise, and fast etching and cleaning of deep structures, narrow features, and large areas. It is capable of etching materials such as polymers, silicon, gallium arsenide, stainless steel, titanium, and many other hard metals. The device is used in the production of mobile phones, medical devices, and electronic components. Overall, TE 5000ATC is an advanced etching and cleaning tool with features that make it suitable for many applications. The device is easy to operate and provides a repeatable, precise etching process. It is capable of etching various materials with high speed and accuracy at high temperatures.
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