Used TEL / TOKYO ELECTRON TE 5000 ATC #9236836 for sale

TEL / TOKYO ELECTRON TE 5000ATC is an etcher / asher designed for plasma processing applications in the semiconductor industry. It utilizes a combination of plasma-assisted etching and wet chemical cleaning processes to create clean and precise features on a substrate. The equipment is specifically designed to achieve a high level of repeatability and accuracy while providing a platform for extensive process development and optimization. TEL TE 5000ATC is a dual-chamber system that can simultaneously process up to two substrates using independent process parameters and settings. The main chamber is equipped with a rotating stage, end-effect fixtures, target control and plasma power supplies, as well as various gases for the generation of ionized solutions targeting the substrate surface. The secondary chamber is equipped with a handling station, a rotating stage and solution supply lines. The substrate is pre-cleaned in the secondary chamber before entering the main chamber for etching processes. TOKYO ELECTRON TE 5000ATC provides a high degree of process control, with an extensive range of gas delivery, pressure, temperature and safety systems. The plasma process parameters can be adjusted both locally and remotely using the touch-screen control panel. The unit is equipped with an in-built wafer edge detection machine and a range of substrates can be accommodated including silicon, and III-V compounds. A variety of etch processes are possible including dry, directional and uniform etching, as well as three-dimensional anisotropic etching. TE 5000ATC interfaces with other industrial automation systems to streamline production and has been designed to ensure that safety is paramount. It features an energy-efficient plasma generation tool which reduces energy consumption and is fully compliant with latest environmental regulations. All in all, TEL / TOKYO ELECTRON TE 5000ATC is an advanced etcher / asher designed for plasma processing applications in the semiconductor industry. Its combination of plasma-assisted etching and wet chemical cleaning processes provides a high level of precision, repeatability and control, as well as facilitating process development and optimization. It is designed with utmost safety considerations for personnel, the environment and the substrate.