Used TEL / TOKYO ELECTRON TE 5000 ATC #9236837 for sale

TEL / TOKYO ELECTRON TE 5000 ATC
ID: 9236837
Wafer Size: 5"
Oxide etcher, 5" Chamber / ATC.
TEL / TOKYO ELECTRON TE 5000 ATC is a state-of-the-art etcher/asher designed to provide precise, repeatable process conditions. Featuring a process chamber with a three-axis translation stage, it is engineered to deliver high-precision results for a wide range of etch and stripping applications. The automatic control equipment provides excellent process repeatability while delivering reliable and repeatable results. This etcher/asher has a vacuum system that is optimized to provide fast chamber evacuation, air inflow and particle removal. An advanced pressure control unit ensures precise and repeatable pressure conditions throughout the etching process. This etcher/asher is equipped with a 1000 W RF power source, allowing operation at a wide range of frequencies for a variety of applications. A multiple-position substrate heater provides excellent temperature uniformity over the entire substrate. An intuitive Human Machine Interface (HMI) allows for easy machine configuration and data recording. This etcher/asher is compatible with a vast array of options, including wet develop systems, an in-situ endpoint detector, an in-situ scavenger, an in-situ backside wafer cleaner, and others. In addition to being easy to use and highly configurable, TEL TE 5000 ATC is also designed with safety in mind, coming with integrated safety systems, such as a vacuum interlock, a potentially explosive atmosphere sensor, a load lock safety interlock, and others. A range of RF monitoring systems are also included, such as the Plasma Monitoring Module, which monitors the RF power and corresponding substrate processed parameters during the etching or stripping process. The improved accuracy of the RF power and the process uniformity also help to further enhance process repeatability. Overall, TOKYO ELECTRON TE 5000ATC is an incredibly powerful etcher/asher that is designed to provide repeatable and reliable results and is an ideal solution for a wide variety of applications. Its advanced features help to ensure repeatability and reliability while providing excellent process uniformity and monitoring capabilities.
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