Used TEL / TOKYO ELECTRON TE 5000 ATC #9236838 for sale

TEL / TOKYO ELECTRON TE 5000 ATC
ID: 9236838
Wafer Size: 6"
Oxide etcher, 6" Chamber / ATC.
TEL / TOKYO ELECTRON TE 5000 ATC is an advanced etcher/asher equipment used in the semiconductor industry. It is designed to deposit and remove material from semiconductor surfaces with precise and repeatable results. The system consists of one central processing chamber, called an Atom Transfer Chemical Vapor Deposition (ATCVD) chamber, as well as two additional Chambers for etching (Reactive Ion Etching (RIE) and Dry Metal Etch (DME)). The ATCVD chamber is used in the deposition of thin films of materials such as silicon, titanium nitride, and aluminum oxynitride onto the semiconductor wafers, to form specific electrical contacts and other structures. Inside the ATCVD chamber, a gas mixture containing the desired material flows from a high-pressure gas cylinder. The flow is finely controlled and automatically adjusted into a tight beam by the ATCVD chamber's Beam Monitoring Unit (BMS). This BMS helps ensure very thin films are deposited with high accuracy and repeatability. The RIE chamber ins used for etching out structures from the semiconductor wafer surfaces, such as connectors, contacts and wiring. In this chamber a gas mixture containing a reactive chemical is introduced into a controlled vacuum environment, forming a commercially-selectable plasma field. This plasma field then selectively etches away undesired material while leaving desired material intact. The DME chamber is used for dry metal etching, meaning the removal of metal layers without the use of a chemical process. This chamber uses an inductively coupled plasma which allows for the reactive removal of material without the need for a vapor phase etchant. All three chambers together provide users with a vast range of advanced processing capabilities. Additionally, TEL TE 5000 ATC is equipped with an advanced safety machine, as well as a graphical user interface with a touch screen. This allows for convenience in inputting commands and the tool's network-compatible architecture allows for easy integration into other systems. It also supports various recipe templates for different custom etching tasks to further increase its flexibility and utility. All in all, TOKYO ELECTRON TE 5000ATC is a highly advanced etching/aschring asset designed for use in the semiconductor industry. It provides its users with consistent results, precise control, safety, and easy user control, making it an ideal choice for processing all kinds of semiconductor surfaces.
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