Used TEL / TOKYO ELECTRON TE 5000 #293652771 for sale

TEL / TOKYO ELECTRON TE 5000 is an etcher and asher system used in semiconductor fabrication, among other industrial processes. The system is composed of a process chamber, wafer transfer robot, load lockers, and a controller. The process chamber is a vacuum-sealed stainless steel enclosure equipped with a planarization chamber, an inductively coupled plasma (ICP) or an electron beam (EB) source, and two gas delivery systems. The planarization chamber is designed to provide an effective plasma sheath layer at the edge of the etch pattern and to provide uniform overetch in the bottom of the trench, thus enabling accurate patterning. The ICP or EB source is responsible for etching trenches, activation and dry etching of SiO2 and Si3N4 layers. The two gas delivery systems are responsible for supplying the etching and cleaning gases for efficient plasma etching and sensing the pressure in the process chamber. The wafer transfer robot is responsible for transferring wafers within the process chamber and between the process chamber and the load locks. The robot is equipped with a bump aligner to align the wafers and tracks embedded in the chamber floor for positioning the robot arm. The robot is controlled by the robot controller and software to ensure wafer transport in a safe and secure manner. The load dogs are used to securely hold the wafers while they are inserted and removed into the process chamber. The load dogs have a built-in micropositioner and vacuum sensing control to ensure correct positioning of the wafer. The controller is responsible for the control of the operations of the whole system. The controller consists of a main board, a user interface board, display board, and a communication interface board. It monitors and regulates the process including flow of gases, power levels, temperatures and pressures, as well as movement of wafers. All of the parameters must be closely monitored to ensure the success of the process. TEL TE5000 offers superior etching and ashing performance when compared to manual processes, providing improved productivity and yield.