Used TEL / TOKYO ELECTRON TE 5000 #9068911 for sale

TEL / TOKYO ELECTRON TE 5000 is an asher or etcher designed for the etching of semiconductor circuits. It is a high-precision machine that can precision etch barriers of a few nanometers to create fine lines in ultra-pure wafers or thin films. The etching process is carefully controlled by a combination of software, hardware and vacuum control hardware. TEL TE5000 is designed for etching in dry (plasma) or wet (liquid) processes. In dry etching, the machine uses a plasma gun and electrodes to build a reactive environment of ions and electrons which etch the design onto the substrate. In wet etching, a liquid chemical is mixed with water, and this solution is sprayed onto the substrate to create the etch. TOKYO ELECTRON TE-5000 can etch both large areas at once (called batch etching) or it can move across the surface of the wafer at a controlled rate while etching small portions in a pattern (called step-and-repeat etching). The machine's vacuums ensure that plasma and liquid are kept away from the wafer, and the various sensors measure the etching process and document the process parameters for quality control purposes. The etching process also can be controlled with computer programs that generate the pattern settings. TEL / TOKYO ELECTRON TE5000 is also capable of producing complex and intricate patterns by using layers of masking material over the wafer or by performing reverse-etch processes. This process creates workable patterns from flat photomasks (called "lift-off"). Additionally, secondary processes such as sputtering, chemical-vapor deposition and ion implantation can also be performed. TE-5000 is a reliable etching system that is capable of producing high-resolution etches quickly and precisely. Its fine control is due to its advanced design combined with its sophisticated software control systems. TE5000 is a valuable tool for precision etching in the semiconductor industry.