Used TEL / TOKYO ELECTRON TE 5000 #9269142 for sale

TEL / TOKYO ELECTRON TE 5000 is a semi-automatic, low-cost etcher / asher. It is designed to etch and or asher thin film materials. TEL TE5000 is equipped with a low-power plasma source, high-output microwave plasma source and a low-pressure, low-valence gas source. The source combination allows etching or ashing of various substrates including glass, silicon, metal and organic materials. TOKYO ELECTRON TE-5000 etch-and-ash equipment is designed to provide low-valence plasma etching and low-pressure chemical ashing processes. TEL / TOKYO ELECTRON TE-5000 etch-and-ash system is controlled through a user-friendly graphical User Interface (GUI). This Interface allows operators to easily program and monitor etching and ashing processes. TEL TE-5000 provides a variety of etching and ashing programs for specific processes such as single-side etch, two-side etch, etch-and-ash and two-step etch-and-ash. TE-5000 also offers a wide range of sputtering mode settings, from low-power DSE mode for cleaning and de-titanium to high-power DCD mode for sputtering aluminum and titanium layers. TEL / TOKYO ELECTRON TE5000 etch-and-ash unit is also equipped with advanced diagnostics technology. The machine offers in-line diagnostics, including real-time analysis and prediction of etch and ashing processes. This technology enables operators to monitor the status of in-situ processing parameters, providing immediate feedback on the etch and ashing process. TEL TE 5000 is constructed from a rigid, sturdy frame and includes a wide range of safety features, such as pressure control mechanisms and cooling systems. TOKYO ELECTRON TE 5000 also comes with a variety of additional features including automatic plasma cleaning, gas recovery and control systems. TOKYO ELECTRON TE5000 is a versatile, low-cost etcher and asher for both etching and ashing thin film materials. It is equipped with an advanced user interface and diagnostics technology, making it easy to operate and monitor etching and ashing processes. TE 5000 provides a low-valence plasma etching and low-pressure chemical ashing mode for a wide variety of substrates. Additionally, the tool offers in-line diagnostics, automatic control systems, and a range of safety features, including pressure control and cooling systems.