Used TEL / TOKYO ELECTRON TE 5000S #197615 for sale

TEL / TOKYO ELECTRON TE 5000S is an etcher/reactive ion etching (RIE) equipment designed with advanced technology and wide compatibility with various types of equipment. Etching is commonly used in electronics applications to fabricate and pattern micro- and nano-scale structures. The system features photolithography, wherein a patterned photoresist is formed on a substrate using ultra-violet (UV) light, which is subsequently etched into the substrate using a reactive gas. TEL TE 5000S is well-suited for a wide range of processes, including dry etching, wet etching, ion-beam etching, physical etching, and other special etching processes. TOKYO ELECTRON TE 5000 S is powered by a networked graphical user interface, which enables efficient and accurate etching process control. Its various settings can be pre-programmed and adjusted for optimal performance. The unit's broad variability in configuration makes it suitable for a variety of etching applications. It employs a wide range of gases, providing an optimal process through individually-adjustable gas fluxes. It has low gases consumption and minimal waste production, helping ensure an increasingly environmental friendly machine. The tool is built with an intelligent process chamber coupled with beam stigmation and reticle-stage alignment systems, providing a high degree of accuracy and stability. It also has a Z-axis height adjustment asset, which is necessary for variable film-etching rate of etching steps. TEL / TOKYO ELECTRON TE 5000 S's chamber temperature can be precisely set to the desired level. The model features advanced safety features, such as automated door lock and emergency shut-off, to protect the operator and environment. Its onboard imaging and metrology systems allow for accurate recording of etch structure. TOKYO ELECTRON TE 5000S features various control functions, such as gas flow and current leakage monitoring, and process gas testing. TE 5000S is an ideal solution for a number of applications, including complex device processing, substrate production, and circuit manufacturing. Its advanced technology makes it a reliable and efficient tool that ensures robust and accurate etching processes. It is a cost-effective equipment that can significantly reduce the fabrication time and cost.