Used TEL / TOKYO ELECTRON TE 5000S #9091958 for sale

TEL / TOKYO ELECTRON TE 5000S is an advanced etching machine designed for semiconductor manufacturing. This model is a single-chamber vertical etcher with a vacuum chamber designed for up to 3-4 etching equations. This etch tool utilizes process parameters that can be adjusted for a wide range of wafer sizes and configurations, enabling high quality etching of all types of semiconductor materials. TEL TE 5000S utilizes two main chambers. The lower chamber is the "etch chamber", which houses the etch hardware, including the substrate shuttle, tube heater, and holder, along with the process equipment such as the reaction and gas delivery systems. The upper chamber is where the wafer is situated during processing. Here, a vacuum and microwave frequency platen is used to heat the wafer before processing and support the wafer for cleaving and sheet etching. TOKYO ELECTRON TE 5000 S has a wide variety of process capabilities, including conventional and deep etching, pattern etching, and selectable area etching. It is capable of etching silicon, gallium arsenide, and other types of amorphous and polycrystalline semiconductor materials. Through the use of in-situ chemical, thermal, and electrical processing, TE 5000S provides a variety of process recipes for the fabrication of electronic devices and semiconductor materials. TEL / TOKYO ELECTRON TE 5000 S is equipped with a multi-step motion control system, which includes a vacuum and motion mimic system that simulates the steps of the etching process before beginning. This enables the user to adjust and optimize the etching process for achieving maximum etching performance. Additionally, TOKYO ELECTRON TE 5000S can be programmed to etch specific layer configurations and structures as required for different processes. TE 5000 S operates with a high-powered RF source to generate the required plasma energy needed for etch processing. This source is used to control both the etch rate and depth of the etching process. Additionally, TEL TE 5000 S offers a variety of features such as mapping and profiling capabilities, reaction source optimization, as well as gas chemistry control to improve etching results. In conclusion, TEL / TOKYO ELECTRON TE 5000S is a state-of-the art vertical etching system that offers a variety of process capabilities and features. With its wide range of etching recipes and processing capabilities, TEL TE 5000S is a versatile tool for semiconductor device fabrication and offers high quality etching results.