Used TEL / TOKYO ELECTRON TE 580 #9137192 for sale

TEL / TOKYO ELECTRON TE 580 is an etching / asher equipment designed and manufactured by TEL Ltd. This system is designed for applications in the semiconductor industry including photolithography, deep reactive ion etching (DRIE) and plasma etching. The unit is equipped with a multi-channel plasma source, a single wafer actuator, and a rotatable susceptor inside the process chamber. TEL TE 580 is highly reliable and can process high-resolution patterns quickly and accurately, reducing costs and turnaround time. TOKYO ELECTRON TE 580 is a fully integrated machine comprising a combination of hardware, software and process technique. The process chambers enable simultaneous etching of several wafers. The tool has a parameter setting window, with an easy-to-use graphical interface for setting the etching parameters quickly and accurately. TE 580 also has a rotatable susceptor which enables uniform pattern in comparison to traditional asher systems. TEL / TOKYO ELECTRON TE 580 can perform both dry and wet etching processes, and its multi-channel plasma source uses electron cyclotron resonance (ECR) technology for efficient plasma generating. The asset provides great flexibility in optimization of baselines and process recipes for different materials and applications. The model is also equipped with an ultra-high vacuum capability which makes it ideal for performing processes such as high-aspect ratio DRIE and remote plasma etching. TEL TE 580 is designed to meet the stringent requirements of the semiconductor industry for high yields, quality and performance. The equipment is equipped with advanced process control features which ensure repeatable processes. The system is capable of controlling high-end process parameters such as temperature, plasma power, pressure control, substrate temperature, ion dose and ion energy. Additionally, TOKYO ELECTRON TE 580 is equipped with specialized tools for detailed process analysis to maximize yields and minimize variability in the etching results. In summary, TE 580 is a reliable and powerful asher unit for the semiconductor industry. Its multi-channel plasma source, rotatable susceptor and advanced process control capability make it ideal for precise and repeatable high-resolutions etching processes. The machine's high-vacuum and process analysis features ensure excellent results consistently.