Used TEL / TOKYO ELECTRON TE 580LC #293819191 for sale

TEL / TOKYO ELECTRON TE 580LC is an etcher / asher that is optimized for applied experiments, analytical experiments, and production. It has a large substrate stage that enables sample loading and unloading without the need for any added tools, a highly improved design for its gas circuit, and a highly efficient vacuum system. This etcher/asher has a computer controlled speed of 0 to 200Hz, allowing easy and precise control of the substrate etching process. Additionally, substrate bias voltage is adjustable from 0 to -200V, enabling control of etching depths and uniformity. It has a unique interface which allows for easy parameter entry, making it a user friendly etcher. For process control, TEL TE 580LC uses high accuracy, in-situ end point detection plus a wide variety of recipe settings. These settings are easily programmable, and the end point detection enables consistent results. Process repeatability and reproducibility are ensured with its excellent side-wall profile control and uniform etching, while its high speed mode delivers fast etching performance. Its extra-large 300mm x 400mm substrate tray can accommodate a wide variety of sample sizes, and its digital 5-step adjustable gas flowmeter allows for accurate and reliable gas introduction. TOKYO ELECTRON TE 580LC is equipped with a chemical-resistant stainless steel chamber for corrosion-resistance and easy maintenance. This etcher/asher also has a dual-frequency RF generator to enable a greater selection of available power with its variable power range up to 500W. Finally, it is equipped with an in-situ cleaning system to prevent particle contamination during processing, ensuring that the etching process will remain clean and stable. TE 580LC is designed to provide users with optimal etching performance for a wide variety of substrates. This etcher/asher has numerous performance features such as precise end point detection, adjustable processing speed, and adjustable gas flow rates which make it ideal for experiments and production. The extra-large substrate size enables a variety of samples to be processed, while its chemical resistant stainless steel chamber ensures reliable performance in a wide variety of climates.