Used TEL / TOKYO ELECTRON TE 580LC #9091959 for sale

TEL / TOKYO ELECTRON TE 580LC is a high-precision plasma etcher / asher that can be used in a wide variety of semiconductor fabrication processes. The machine uses plasma to etch or asher patterns into a semiconductor substrate. Its advanced technology enables high throughput and low defect rates, as well as enhanced film uniformity and substrate-to-substrate repeatability. The machine has a high speed of up to 300mm/s which ensures that the etch or asher process is completed quickly, and the high rate of throughput maximises productivity. The rigid construction and advanced motor control system ensure accurate etching, as the machine has no vibration even at high speed. Its vertical up-down load lock configuration ensures easy sample loading and unloaded. Additionally, minimal transfer delays due to high mass accuracy and temperature control are possible. TEL TE 580LC has a variable pressure chamber capable of forming a quality plasma for etching or ashing processes. This enables the machine to operate with a wide range of etchants such as fluorine-containing chemicals, semi-conductor-grade hydrochloric and sulfur-based acids. It also has titanium integrally-machined substrate holders, allowing for a highly uniform etch process. For user convenience, the machine also has an ergonomic design, which includes an angled LCD monitor angled towards the user, and a user-friendly GUI (Graphical User Interface) with customised process settings and a large memory for recipe storage. To ensure safety, TOKYO ELECTRON TE 580LC has a unique built-in Leak Detection System which automatically detects and alarms potential hazards for leakage of corrosive liquid as well as a highly efficient, programmable safety protocols. Overall, TE 580LC is a top-of-the-line etcher / asher with a range of features designed to deliver highly reliable, repeatable and cost-effective processes. Its advanced technology enables efficient and accurate etching or ashing with minimal transfer delays due to high mass accuracy and controlled temperatures. Additional features such as the variable pressure chamber and titanium machined substrate holders ensure the highest quality etching. Its ergonomic design, user-friendly GUI, and safety protocols add to the user convenience and ensure safety while processing.