Used TEL / TOKYO ELECTRON TE 580LC #9109092 for sale

TEL / TOKYO ELECTRON TE 580LC (TEL TE 580LC) is an advanced etcher/asher used in the manufacture of semiconductor devices. TOKYO ELECTRON TE 580LC is a fully-automated, high-end processing equipment designed to provide superior accuracy and repeatability for etching and ashing delicate metal and polysilicon deposits on wafers. The system uses an inductively-coupled Ar/O2 plasma to charge the ions and deposit particles on the surface of the wafer. Plasma is generated in a controlled environment using high-frequency ICP (Inductively Coupled Plasma) power with precise control of the ion energy. The ICP's high energy and low-noise signal ensure the desired properties of the etched/ashed surface are achieved. TE 580LC offers unparalleled process speed and accuracy. Variable frequency ICP power is used to increase the etching rate and improve the surface uniformity of the etch. Additionally, TEL / TOKYO ELECTRON TE 580LC can be configured with electrostatic clamping for wafer stick prevention, while the turn synchronization ability allows for process uniformity over multiple wafers. The unit has a small footprint, making it ideal for use in tight laboratory spaces. Its user-friendly interface and automated processes allow for efficient and quick processing of wafers. The machine includes a vacuum chamber with a low pressure environment, enabling it to function without outgassing or leaching. Finally, TEL TE 580LC is fully compatible with a wide range of wafer sizes, allowing customers to customize the tool to meet their processing needs. Furthermore, process parameters can be adjusted to optimize etching and ashing on different wafer materials. In summary, TOKYO ELECTRON TE 580LC is the ideal etching and ashing asset for the production of delicate metal and polysilicon deposits on wafers. Its advanced performance, compact design, and user-friendliness make TE 580LC the optimal choice for etching and ashing in the semiconductor manufacturing industry.