Used TEL / TOKYO ELECTRON TE 7400 #293667490 for sale

TEL / TOKYO ELECTRON TE 7400 is a highly efficient etcher/asher used for advanced substrate processing applications. Due to its capability to mix multiple gases for low temperature, high selectivity, and low damage etching, TEL TE 7400 is ideal for a wide variety of advanced processes for silicon, gallium arsenide, carbon, and quartz substrates. TOKYO ELECTRON TE 7400 offers advanced process control with multiple gas and dimension control valves (DCV) for precise etching times and process control. Multiple reactive gas sources can be connected to TE 7400 to achieve ultra-low damage Ashing processes. Gas delivery and process parameters can be precisely tuned by use of a repeatable parametric memory. TEL / TOKYO ELECTRON TE 7400 has an off-axis, high-resolution plasma generator, which produces high quality plasma with a targeted etch rate and a low background damage level. The off-axis generator has a built-in device deposition chamber enabling wafer backside contamination protection. Additionally, the plasma generator has cooling and safety protection features that ensure etch results are of high quality and in a safe environment. TEL TE 7400 features a multi-zone thermal control equipment with quartz channel module, allowing users to precisely control gas temperature from -20°C to 250°C. This thermal control system has improved process uniformity and the additional flexibility offered by the process gas control provides efficient utilization of the etching gases. TOKYO ELECTRON TE 7400 has a variety of process monitoring and control features such as remote monitoring, plasma profiling unit, and the most advanced image analysis machine for better throughput and accuracy, as well as the ability to check critical process results. Additionally, TE 7400 offers a wide range of software control modules, which can be interfaced with external systems such as process control systems to further extend its capabilities. All in all, TEL / TOKYO ELECTRON TE 7400 is a state-of-the-art etching and ashing tool that provides flexible substrate processing capabilities with advanced process control features. It is suitable for use in a variety of advanced substrate processing applications.