Used TEL / TOKYO ELECTRON TE 8401 IME #9128551 for sale

TEL / TOKYO ELECTRON TE 8401 IME
ID: 9128551
Wafer Size: 6"
Vintage: 2001
Dry etcher, 6" 2001 vintage.
TEL / TOKYO ELECTRON TE 8401 IME is a highly advanced etcher / asher designed to handle a wide variety of materials. Its advanced design is ideal for the most precise etching and ashing processes required for up-to-date semiconductor production while still providing a means of making high-quality and reliable products. The equipment is equipped with an X-Y stage, loadlocks, and a variety of Chuck systems, allowing for a wide range of wafers to be worked on. The loadlock features a high-vacuum environment, enabling higher vacuum levels than other standard machines. Additionally, the stage has an extremely long travel distance, allowing for fine adjustments of the wafer to achieve the highest possible process accuracy. TEL TE 8401 IME is fast and efficient, and can process large volumes of wafers with short process times. Built-in temperature controllers allow for optimal environmental control while maintaining a precise temperature and pressure to enable high-quality etching and ashing processes. TOKYO ELECTRON TE 8401 IME is highly optimized for both wet and dry etching with a selection of optional etch tools available. Furthermore, its advanced wafer alignment system ensures accurate placement and ashing within tight tolerances. The machine is also equipped with a controller to monitor the etching and cleaning processes in real time. Other features of TE 8401 IME include an automated substrate loading system, as well as a recipe management system for managing the process steps required for each individual wafer. It also offers advanced metrology and step-and-repeat capabilities for precise measurements of the etching and ashing processes. The advanced design of TEL / TOKYO ELECTRON TE 8401 IME enables its users to create highly accurate and reliable products with reliable, precise etching and ashing processes. Its uniformity and uniformity control ensure product-level consistency. The equipment is equally adept at both wet and dry etching, as well as other intermediate processes necessary to create advanced ICs, allowing for fast and efficient semiconductor production. Its flexibility, production capability and straightforward interface make it suitable for use in a wide range of applications.
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