Used TEL / TOKYO ELECTRON TE 8401 #9292597 for sale

ID: 9292597
Wafer Size: 8"
Vintage: 1992
Si Dry etcher, 8" 1992 vintage.
TEL / TOKYO ELECTRON TE 8401 is an advanced chemical etcher/asher that provides precise deposition and etching for various materials, including ceramic and metals. It is designed for advanced materials processing, such as thin-film deposition, crystallization, and doping. The equipment utilizes a low-pressure, vacuum deposition method that enables submicron deposition thicknesses with high aspect ratio features. The system operates on its own independent PLC and dedicated process computer, allowing for utilization of advanced technologies, processes, and recipes. The unit's electrode bias control provides the highest resolution etching available and its tri-zone with accurate concentration control guaranties high-precision etching and deposition. Using a single wafer method allows for precise uniformity and flexibility to meet the most demanding production requirements. The low-pressure process also ensures no damage of the underlying wafer. Its auto-gauging unit provides quick and precise measurements of the substrate profile. The machine has a user-friendly interface and a wide variety of recipes and programs, giving users complete control over the entire etching and deposition process. These programs are regularly updated to ensure the tool can keep up with the latest advances in materials science. It is also capable of storing several recipes, so that they can be utilized as needed. Utilizing GEM80, the combination of TEL TE 8401 and the GEM80 delivers unmatched material etching and deposition control. This features recipes which are optimized to produce small features, such as metallization line and ITO/LCL thin film components. GEM80 also supports conformal coating processes, enabling deposition of ultra-thin layers of polymers or metals from a few angstroms to several microns in thickness. The versatile TOKYO ELECTRON TE-8401 etcher/asher is a powerful tool that enables precise deposition and etching for a variety of materials. Its advanced features and user-friendly interface make it a perfect choice for advanced materials processing.
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