Used TEL / TOKYO ELECTRON TE 8401 #9398263 for sale

TEL / TOKYO ELECTRON TE 8401
ID: 9398263
Wafer Size: 8"
Vintage: 1992
Si Dry etcher, 8" 1992 vintage.
TEL / TOKYO ELECTRON TE 8401 is an etcher/asher designed for precision etching and ashing applications. It is a batch plasma etcher/asher with a heated pedestal that allows for etching and ashing of fine features with a low thermal budget. It features high bias power levels to precisely control etch and ashing rates, high uniformity and a wide etch and ashing window. TEL TE 8401 has four modes of operation: etching, ashing, sputtering, and cleaning. It is equipped with a dry-type, quadri-filter equipment that includes four types of filters, namely, the etch chamber, the reaction chamber, the cooling chambers, and the purge chamber. In etching mode, TOKYO ELECTRON TE-8401 can be used for etching of fine features with its high maximum power of 600 W. With its advanced etching/ashing window, wide chamber temperature range, and high uniformity, TE-8401 can be used for high-resolution etching/ashing of small features with improved performance. It allows for the formation of equally spaced features on the wafer surface with its uniform etch/ashing properties. TOKYO ELECTRON TE 8401 also has an active control system for controlling stage temperature and pressure for uniform plasma parameters. In ashing mode, TE 8401 is used to remove undesired layers by using high bias power levels. Its high repeatability and minimal thermal budget makes it ideal for removing polymers and thin metal films. TEL TE-8401's active gas management unit maintains chamber pressure with low etch pressures and high ashing rates without reducing dielectric etch selectivity through its high bias power control. Additionally, TEL / TOKYO ELECTRON TE-8401's advanced operating mode allows for greater throughput and improved temperature uniformity. In sputtering mode, TEL / TOKYO ELECTRON TE 8401 can provide excellent deposition rates with its high deposition ability. With its high bias power levels and excellent uniformity, it can be used for thin film deposition and sputter cleaning. The device is also equipped with a conventional cavity-type sputter chamber for application-specific sputtering capability. Finally, TEL TE 8401's built-in cleaning mode allows for residue removal with minimal thermal budget implementation. This reduces the chances of contamination and improves the uniformity of the etched surfaces for various applications. Overall, TOKYO ELECTRON TE-8401 is an advanced etcher/asher designed for optimal etch and ashing of fine features. It features high bias power levels, high uniformity, a wide etch/ashing window, active gas management machine, and four operating modes. This high-performance device is an invaluable production tool for precision etching/ashing applications.
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