Used TEL / TOKYO ELECTRON TE 8500 PATC #73160 for sale

TEL / TOKYO ELECTRON TE 8500 PATC is an etcher/asher machine designed for the on-site generation of compound semiconductor material such as aluminum gallium arsenide (AlGaAs). This machine features a high-performance TEL 8500 etching/asching process, which is used to create custom semiconductor devices. TEL TE 8500 PATC consists of a base unit that houses TOKYO ELECTRON 8500 etching/asching process and several semiconductor pre-treatment components. The base unit inherently contains a vacuum chamber, a mechanical stage, sensor control, and data acquisition systems. The base unit also connects to several external pre-treatment components, such as a vacuum pump, transfer rod, and TEL / TOKYO ELECTRON 8500 etching/ashing tool itself. The vacuum chamber portion of TOKYO ELECTRON TE 8500 PATC allows for a leak-tolerant etching/asching process that uses a secondary etching/ash­ing gas. This dual-gas procedure exposes the substrate to a reactive gas atmosphere with outgassing from the substrate being minimised, which results in an etching/ashing process that is repeatable and produced generally defect-free substrates. The mechanical stage contained within TE 8500 PATC allows for accurate removal of unwanted material from a substrates' surface. The stage is coupled to several computer-controlled actuators and sensors, which allow for precise automated handling and etching/ashing. Additionally, the position of the mechanical stage can be easily monitored and adjusted during the etching/ashing process to ensure accuracy and efficiency. The sensor control equipment of TEL / TOKYO ELECTRON TE 8500 PATC system is used to monitor and re-establish the accuracy of the etching/ashing process by providing feedback to the process controller. This feedback can be used to identify any abnormal conditions that may be present, such as reduced etching/ashing uniformity or fluctuations in the etching/ashing speed. This unit also helps to minimise the possibility of an etching/ashing failure due to any unforeseen conditions. The data acquisition machine of TEL TE 8500 PATC is used to record and display all the various process parameters for the etching/ashing process, such as substrate temperature, gas flow and pressure, etc. This data is stored and can be used to analyse the etching/ashing process and to adjust the parameters in order to optimise the quality of the etching/ashing process. Overall, TOKYO ELECTRON TE 8500 PATC is an extremely advanced on-site etching/ashing tool for the custom generation of compound semiconductors. By incorporating a vacuum chamber, mechanical stage, sensor control asset and data acquisition model, this machine provides an efficient etching/ashing process while maintaining a safe working environment and accuracy of the etching/ashing.