Used TEL / TOKYO ELECTRON TE 8500 #293634691 for sale

TEL Limited (TOKYO ELECTRON) TEL / TOKYO ELECTRON TE 8500 is an Etcher/Asher equipment designed for advanced plasma etching and deposition processes in the semiconductor and flat panel industries. The system was developed to reduce the costs of process development and manufacturing while achieving higher throughput and higher accuracy than conventional systems. TEL TE 8500 can process multiple substrates at once, combined with a high-density plasma source up to 25 locations, and is optimized for performing precision etching and doping operations. The unit is equipped with advanced temperature control and process visualization technologies to monitor and optimize processing conditions for improved efficiency and process uniformity. It is also capable of accommodating a wide variety of wafer diameters, substrate sizes, and process recipes. TOKYO ELECTRON TE 8500 utilizes a proprietary floating chuck technology that avoids local thermal stress, ensuring optimal temperature control and accuracy during continuous operation. It is able to manage multiple process chambers with gap-free alignment to ensure uniform process discharge distribution. The machine can also perform temperature measurements from each chuck in the etcher/asher chamber with a latency of just 1 millisecond and a temperature stability of better than 1°C. This high precision temperature control is crucial for ensuring a higher yield rate and longer wafer lifetime in the semiconductor manufacturing process. TE 8500 also incorporates a number of advanced plasma control and process monitoring tools to ensure a highly reliable and reproducible etching and deposition process. It utilizes spectral analysis to provide real-time characterization of the plasma, allows plasma parameters to be adjusted with just a few clicks, and provides visual process monitoring in the recipe editor to track and analyze process progress. In addition, TEL / TOKYO ELECTRON TE 8500 is capable of high-resolution recording of etching and doping processes, and allows users to easily modify process recipes to optimize performance. Furthermore, the tool's user-friendly interface and remote control capabilities enable efficient collaboration between process engineers, substrate testers, and process operators, boosting process development and improvement. Overall, TEL TE 8500 is an advanced etcher and asher asset that combines efficient process control, reliable performance, and user-friendly features to enable high-accuracy etching and doping operations. Its robust design and high-precision process control capabilities make it an ideal choice for semiconductor and flat panel production processes.